Hypochlorous acid-based hand sanitizer

ABSTRACT

A sanitizing formulation is disclosed for use as a hand sanitizer. The formulation may include hypochlorous acid, a silicone polymer or blend thereof, sodium phosphate, hydrochloric acid, and sodium magnesium silicate. Methods of using and making the sanitizing formulation are also disclosed.

RELATED APPLICATIONS

This application is a divisional application of U.S. application Ser.No. 15/421,772, filed Feb. 1, 2017, which claims the benefit of priorityto U.S. Provisional Patent Application No. 62/394,983, filed Sep. 15,2016, the disclosures of which are incorporated by reference herein inits entirety.

FIELD OF THE DISCLOSURE

The present disclosure relates generally to sanitizer formulations andmethods of use. More specifically, the present disclosure is related tohand sanitizers having hypochlorite, or acids or salts thereof, sodiummagnesium silicate, and a silicone polymer or blend thereof, and methodsof sanitizing hands using the formulations described herein.

BACKGROUND

Sanitizers are used in a variety of applications, including in home use,medical facilities, or industrial applications. Sanitizers are usefulfor their antimicrobial properties, including the ability to removemicrobes from surfaces. Such microbes include, for example, bacteria,yeasts, viruses, fungi, mold, and protozoa. These microorganismscontribute to human disease. Therefore, it is desirable to remove thesemicroorganisms from surfaces.

Many microorganisms develop a tolerance for sanitizing formulations. Forexample, some microorganisms have become resistant to treatments, andare responsible for serious infections in hospitals and other healthcarefacilities. Such microorganisms are sometimes referred to as superbugs.These superbugs have developed resistance to standard cleaningprocedures and/or resistance to many disinfectants (such asantibiotics).

A common means of removing microorganisms from a surface, such as hands,includes washing with soap. The use of soap is effective at removal ofmicroorganisms, but requires large quantities of water to remove thesoap from the surface being disinfected. Thus, in locations where wateris limited or inaccessible, or where the use of water is impractical,the use of soap to disinfect a surface is undesirable or inconvenient.In addition, the frequent use of soap in the washing of hands can resultin increased dryness of hands, causing discomfort and irritation.

Many sanitizing compositions contain alcohol. Alcohol is a knowndisinfectant that destroys microorganisms that are living on the surfaceof an object, such as on hands, instruments, or other surfaces. Alcoholdiffuses through the bacterial cell membrane, denatures bacterialproteins, thereby destroying bacteria. The use of alcohol indisinfectants is convenient because alcohol rapidly evaporates,eliminating the use of water to remove the sanitizer from the surface orfrom the skin. However, alcohol-based sanitizers are difficult to cleanwhen spilled in hospitals or in health care facility settings.Alcohol-based sanitizers also release undesirable fumes and odors thatcause irritation. Furthermore, alcohol-based sanitizers can be thesource of alcohol poisoning.

SUMMARY

The present disclosure describes sanitizing compositions havinghypochlorite, or acids and salts thereof, a silicone polymer or a blendthereof, and sodium magnesium silicate. Also described are methods ofusing the sanitizing formulations. The formulations and methods of usingthe formulations described herein can be used as an effectivedisinfectant against drug-resistant microorganisms.

Accordingly, provided herein is a sanitizing formulation. In someembodiments, the sanitizing formulation includes one or more ofhypochlorite, a silicone polymer or blend thereof, a buffer, and anemulsifier.

In some embodiments is provided a formulation including one or more of ahypochlorite solution and a silicone polymer or blend thereof.

In some embodiments, the sanitizing formulation includes, for example,one or more of hypochlorous acid, sodium phosphate, sodium magnesiumsilicate, and a silicone polymer or blend thereof.

In some embodiments, the hypochlorous acid is present in an amount ofabout 10, 15, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85,90, 95, 100, 120, 150, 175, 200, 250, or 300 ppm or within a rangedefined by any two of the aforementioned amounts. In some embodiments,the hypochlorous acid is present in an amount of about 50 to about 200ppm. In some embodiments, the hypochlorous acid is present in an amountof about 75 ppm.

In some embodiments, the sodium phosphate is present in an amount ofabout 0.05%, 0.1%, 0.2%, 0.3%, 0.4%, 0.5%, 1%, 1.5%, 2%, or 2.5% w/v orwithin a range defined by any two of the aforementioned amounts. In someembodiments, the sodium phosphate is present in an amount of about 0.1to about 0.5% w/v. In some embodiments, the sodium phosphate is presentin an amount of about 0.2% w/v.

In some embodiments, the sodium magnesium silicate is present in anamount of about 0.1%, 0.25%, 0.5%, 0.75%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%,4%, 4.5%, 5%, 6%, 7%, 10%, or 15% w/v or within a range defined by anytwo of the aforementioned amounts. In some embodiments, the sodiummagnesium silicate is present an amount of about 0 to about 5% w/v. Insome embodiments, the sodium magnesium silicate is present in an amountof about 3% w/v.

In some embodiments, the silicone polymer or blend thereof is a blend ofdimethicone and/or cyclomethicone. In some embodiments, the blend ofdimethicone and cyclomethicone is present in an amount of about 0.5%,1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 10%, or 15%, w/v or within arange defined by any two of the aforementioned amounts. In someembodiments, the blend of dimethicone and cyclomethicone is present inthe sanitizing formulation in an amount of about 1 to about 10% w/v. Insome embodiments, the blend of dimethicone and cyclomethicone is presentin an amount of about 3% w/v.

In some embodiments, the blend of dimethicone and cyclomethicone has aratio of dimethicone to cyclomethicone of about 1:5, 1:4, 1:3, 1:2, 1:1,2:1, 3:1, 4:1, or 5:1, or within a range defined by any two of theaforementioned ratios. In some embodiments, the ratio of dimethicone tocyclomethicone is about 1:1.

In some embodiments is provided a sanitizing formulation, includinghypochlorous acid in an amount of about 75 ppm, sodium phosphate in anamount of about 0.2% w/v, sodium magnesium silicate in an amount ofabout 3% w/v, and a blend of dimethicone and cyclomethicone in a ratioof about 1:1 in an amount of about 3% w/v.

In some embodiments, the sanitizing formulation includes hydrochloricacid (HCl). In some embodiments, the hydrochloric acid is present in anamount of about 0.01%, 0.02%, 0.03%, 0.04%, 0.05%, 0.06%, 0.07%, 0.08%,0.09%, 0.1%, 0.2%, 0.3%, 0.4%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%,4.5%, 5%, 6%, 7%, 10%, 15%, or greater w/v%, or in an amount within anytwo of the aforementioned values. In some embodiments, the HCl ispresent in an amount of about 0.08% w/v. In some embodiments,hydrochloric acid is added to the sanitizing formulation as a final stepto adjust the pH of the formulation. In some embodiments, hydrochloricacid increases the total number of ions, and increases the viscosity ofthe sanitizing formulation. In some embodiments, the formulationincludes hydrochloric acid or sodium phosphate. In some embodiments, theformulation includes hydrochloric acid, but not sodium phosphate. Insome embodiments, the formulation includes sodium phosphate, but nothydrochloric acid.

In some embodiments, the pH of the formulation is about 5.0, 5.5, 6.0,6.5, 6.6, 6.7, 6.8, 6.9, 7.0, 7.1, 7.2, 7.3, 7.4, 7.5, 7.6, 7.7, 7.8,7.9, 8.0, or 8.5, or within a ranged defined by any two of theaforementioned values. In some embodiments, the pH of the formulation isin a range from about 6.5 to about 7.8.

In some embodiments, the sanitizing formulation includes water and/orbuffer. In some embodiments, the water and/or buffer comprises all orsubstantially all of the balance of the sanitizing formulation.

In some embodiments is provided a method for disinfecting a surface. Insome embodiments, the method includes applying to a surface a sanitizingformulation comprising hypochlorous acid. In some embodiments, thesanitizing formulation is as described herein. Thus, in someembodiments, the sanitizing formulation includes hypochlorous acid,sodium phosphate, sodium magnesium silicate, and a blend of dimethiconeand/or cyclomethicone. In some embodiments, the sanitizing formulationincludes hydrochloric acid, water, and a buffer, or combinationsthereof. In some embodiments, the sanitizing formulation includes about75 ppm hypochlorous acid, about 0.2% w/v sodium phosphate, about 3% w/vsodium magnesium silicate, and about 3% w/v of a blend of dimethiconeand cyclomethicone.

In some embodiments, the surface for sanitizing is skin. In someembodiments, the surface for sanitizing is a hand or hands of a subject.In some embodiments, the subject is an animal. In some embodiments, thesubject is a mammal. In some embodiments, the subject is a human. Insome embodiments, applying a sanitizing formulation to a surfaceincludes killing at least one superbug.

In some embodiments, a superbug includes a microorganism that hasdeveloped a resistance or tolerance to a drug treatment. In someembodiments, the superbug includes Staphylococcus aureus (includingmethicillin-resistant S. aureus (MRSA) and vancomycin-resistant S.aureus (VRSA)), extended spectrum beta-lactamase (ESBL), Pseudomonasaeruginosa, Clostridium difficile, Salmonella, Mycobacteriumtuberculosis, Escherichia coli (including Carbapenem resistant E. coli),multidrug-resistant Acinetobacter baumannii (MRAB), vancomycin-resistantEnterococcus (VRE), Carbapenem resistant Klebsiella pneumoniae, HIV,hepatitis, and influenza, or a combination thereof.

In some embodiments, the method includes providing the sanitizingformulation and applying the sanitizing formulation. In someembodiments, the sanitizing formulation is provided as a ready-to-useformulation that includes hypochlorite or acids or salts thereof, asilicone polymer or blend thereof, sodium phosphate, sodium magnesiumsilicate, and further may include hydrochloric acid, water, or buffer.In some embodiments, the sanitizing formulation is provided in portions,and further additions and/or mixing is required prior to use. In someembodiments, the sanitizing formulation is applied to a hand or hands ofa subject. In some embodiments, the sanitizing formulation is applied onthe surface of a device. In some embodiments, the sanitizing formulationis applied multiple times daily, once daily, multiple times weekly, onceweekly, multiple times monthly, or once monthly, or within a time framedefined by any two of the aforementioned time frames. In someembodiments, the sanitizing formulation is applied liberally. In someembodiments, the sanitizing formulation is applied meagerly.

In some embodiments is provided a method of sanitizing hands. In someembodiments, the method includes applying to a user's hands a sanitizingformulation. In some embodiments, the sanitizing formulation is theformulation as described previously. In some embodiments, the sanitizingformulation includes hypochlorous acid, sodium phosphate, sodiummagnesium silicate, and a silicone polymer or blend thereof. In someembodiments, the sanitizing formulation includes hypochlorous acid in anamount of about 75 ppm, sodium phosphate in an amount of about 0.2% w/v,sodium magnesium silicate in an amount of about 3% w/v, and a blend ofdimethicone and cyclomethicone in an amount of about 3% w/v. In someembodiments, the sanitizing formulation includes water, hydrochloricacid, buffer, or combinations thereof.

In some embodiments, applying a sanitizing formulation to a user's handsincludes killing at least one superbug. In some embodiments, a superbugincludes a microorganism that has developed a resistance or tolerance toa drug treatment. In some embodiments, the superbug is at least oneselected from the group consisting of Staphylococcus aureus (includingmethicillin-resistant S. aureus (MRSA) and vancomycin-resistant S.aureus (VRSA)), extended spectrum beta-lactamase (ESBL), Pseudomonasaeruginosa, Clostridium difficile, Salmonella, Mycobacteriumtuberculosis, Escherichia coli (including Carbapenem resistant E. coli),multidrug-resistant Acinetobacter baumannii (MRAB), vancomycin-resistantEnterococcus (VRE), Carbapenem resistant Klebsiella pneumoniae, HIV,hepatitis, and influenza.

In some embodiments, the method includes providing the sanitizingformulation and applying the sanitizing formulation to a hand or handsof a subject. In some embodiments, the sanitizing formulation isprovided as a ready-to-use formulation that includes hypochlorite oracids or salts thereof, a silicone polymer or blend thereof, sodiumphosphate, sodium magnesium silicate, and further may includehydrochloric acid, water, or buffer. In some embodiments, the sanitizingformulation is provided in portions, and further additions and/or mixingis required prior to use. In some embodiments, the sanitizingformulation is applied on the surface of a device. In some embodiments,the sanitizing formulation is applied multiple times daily, once daily,multiple times weekly, once weekly, multiple times monthly, or oncemonthly, or within a time frame defined by any two of the aforementionedtime frames. In some embodiments, the sanitizing formulation is appliedliberally. In some embodiments, the sanitizing formulation is appliedmeagerly.

In some embodiments is provided a method of making a sanitizingformulation. In some embodiments, making a sanitizing formulationincludes mixing a hypochlorite solution with a silicone polymer to forma sanitizing formulation.

DETAILED DESCRIPTION

It will be readily understood that the aspects of the presentdisclosure, as generally described herein, can be arranged, substituted,combined, separated, and designed in a wide variety of differentconfigurations, all of which are explicitly contemplated herein.

Sanitizing compositions, including hand sanitizing compositions aredescribed herein that are useful for disinfecting a surface, includingskin and hands. In some embodiments is provided a method of sanitizinghands including applying the sanitizing solution as described herein toa user's hands. In some embodiments, the sanitizing composition may beused alone or in combination with other antibiotics or sanitizingsolutions. In some embodiments, sanitizing solutions may be useful fordisinfecting a surface to remove bacteria, viruses, yeasts, fungi,molds, and protozoa.

Definitions

Unless defined otherwise, technical and scientific terms used hereinhave the same meaning as commonly understood by one of ordinary skill inthe art to which the present disclosure belongs. For purposes of thepresent disclosure, the following terms are defined below.

By “about” is meant a quantity, level, value, number, frequency,percentage, dimension, size, amount, weight or length that varies by asmuch as 30, 25, 20, 15, 10, 9, 8, 7, 6, 5, 4, 3, 2 or 1% to a referencequantity, level, value, number, frequency, percentage, dimension, size,amount, weight or length.

Throughout this specification, unless the context requires otherwise,the words “comprise,” “comprises,” and “comprising” will be understoodto imply the inclusion of a stated step or element or group of steps orelements but not the exclusion of any other step or element or group ofsteps or elements.

By “consisting of” is meant including, and limited to, whatever followsthe phrase “consisting of.” Thus, the phrase “consisting of” indicatesthat the listed elements are required or mandatory, and that no otherelements may be present. By “consisting essentially of” is meantincluding any elements listed after the phrase, and limited to otherelements that do not interfere with or contribute to the activity oraction specified in the disclosure for the listed elements. Thus, thephrase “consisting essentially of” indicates that the listed elementsare required or mandatory, but that other elements are optional and mayor may not be present depending upon whether or not they materiallyaffect the activity or action of the listed elements.

In some embodiments, the “purity” of any given agent (for example,dimethicone or hypochlorous acid) in a composition may be specificallydefined. For instance, certain compositions may include, for example, anagent that is at least 80, 85, 90, 91, 92, 93, 94, 95, 96, 97, 98, 99,or 100% pure, including all decimals in between, as measured, forexample and by no means limiting, by analytical chemistry techniques.

As used herein, the terms “function” and “functional” and the like referto a biological, chemical, mechanical, or therapeutic function.

As used herein, the term “sanitizing composition” refers to acomposition or formulation that is capable of disinfecting a surface. Asanitizing composition has anti-microbial properties, capable ofremoving microorganisms from a surface, and capable of preventing growthand proliferation of microorganisms on a surface. In some embodiments,the sanitizing composition is applied to a surface, such as a medicalinstrument or device, or to a biological surface. Biological surfacesinclude skin or hair of an animal, including, for example the skin orhair of a human. In some embodiments, the sanitizing composition is ahand sanitizer for use on the hands to destroy microorganisms or toprevent or inhibit the growth of microorganisms.

In some embodiments, microorganisms include superbugs, which aremicroorganisms that have developed a tolerance for or resistance todisinfecting agents, and are therefore not affected by anti-microbialtreatments. In some embodiments, sanitizing compositions describedherein are effective at inhibiting or preventing the growth ofmicroorganisms on a surface, including preventing or inhibition thegrowth of superbugs. In some embodiments, administration of a sanitizingcomposition will kill one or more microorganisms or superbugs. In someembodiments, superbugs include, for example, Staphylococcus aureus(including methicillin-resistant S. aureus (MRSA) andvancomycin-resistant S. aureus (VRSA)), extended spectrum beta-lactamase(ESBL), Pseudomonas aeruginosa, Clostridium difficile, Salmonella,Mycobacterium tuberculosis, Escherichia coli (including Carbapenemresistant E. coli), multidrug-resistant Acinetobacter baumannii (MRAB),vancomycin-resistant Enterococcus (VRE), Carbapenem resistant Klebsiellapneumoniae, HIV, hepatitis, and influenza.

“Hypochlorous acid”, as used herein, refers to a weak acid having thechemical formula HClO. Hypochlorous acid is also known as chloric (I)acid, chloranol, or hydroxidochlorine. Salts of hypochlorous acid arereferred to herein as hypochlorites, and can include, for example,sodium hypochlorite (NaClO), calcium hypochlorite (Ca(ClO)₂), orpotassium hypochlorite (KClO). It is intended that the term hypochloriteinclude the ion having the chemical formula ClO⁻. As described herein,hypochlorous acid and hypochlorite are used as killing agents, skincleansing agents, disinfectants, antibacterial agents, sanitizers,and/or preservatives. Hypochlorite, or acids and salts thereof, may beused in the sanitizing compositions of the present disclosure at anamount of about 0.5%, 1%, 5%, 10%, 15%, 20%, 25%, 30%, 40%, 50%, orgreater w/v%, or within a range defined by any two of the aforementionedamounts. In some embodiments, the w/v% of hypochlorite or an acid orsalt thereof is about 25% w/v. In some embodiments, the hypochloritesalt or hypochlorous acid is added directly to a sanitizing composition.In some embodiments, the final amount of hypochlorite is less than,greater than, or equal to about 10, 15, 20, 25, 30, 35, 40, 45, 50, 55,60, 65, 70, 75, 80, 85, 90, 95, 100, 120, 150, 175, 200, 300 ppm orwithin a range defined by any two of the aforementioned amounts. In someembodiments, the amount of hypochlorite in the sanitizing composition isbetween about 50 to about 100 ppm. In some embodiments, the amount ofhypochlorite in the sanitizing composition is about 75 ppm.

In some embodiments, the hypochlorite is added to the sanitizingcomposition as a hypochlorite solution. In some embodiments, thehypochlorite solution is prepared from hypochlorite salt or hypochlorousacid. In some embodiments, the solution of hypochlorite is prepared bypassing a sodium chloride solution through electrolysis. In someembodiments, the sodium chloride solution is a 0.1%, 0.15%, 0.2%, 0.25%,0.3%, 0.35%, 0.4% or greater w/v% or within a range defined by any twoof the aforementioned amounts. In some embodiments, the sodium chlorideis 0.28%, and the resulting hypochlorite solution is 300 ppm. In someembodiments, the hypochlorite solution is added to the sanitizingcomposition in an amount of about 0.5%, 1%, 5%, 10%, 15%, 20%, 25%, 30%,40%, 50% or greater w/v%, or within a range defined by any two of theaforementioned amounts. In some embodiments, the solution includes, forexample, about 300 ppm hypochlorite is added to a sanitizing compositionin an amount of about 25% w/v.

As used herein, silicone polymers include dimethicone, which is alsoknown as polydimethylsiloxane (PDMS), dimethylpolysiloxane, E900, orpolymerized siloxane and has the chemical formula ofCH₃[Si(CH₃)₂O]_(n)Si(CH₃)₃ where n is the number of repeating monomer[Si(CH₃)₂] units. Silicone polymers also include cyclomethicone, whichis a cyclic siloxane. The formulations described herein include blendsof silicone polymers, including blends of dimethicone andcyclomethicone. Silicone polymers are used as an inert slip agent andincrease the comfort of sanitizing compositions. The silicone polymer orblend of silicone polymers may be used in the sanitizing composition inan amount of about 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%,10%, or 15%, or greater w/v%, or in an amount within any two of theaforementioned values or between a range defined by these values. Insome embodiments, the amount of silicone polymer or a blend of siliconepolymers is about 3% w/v. The blend of silicone polymers may include aratio of dimethicone to cyclomethicone in an amount of about 1:5, 1:4,1:3, 1:2, 1:1, 2:1, 3:1, 4:1, or 5:1, or within an amount defined by anytwo of the aforementioned ratios. In some embodiments, the ratio ofdimethicone to cyclomethicone is about 1:1.

As used herein, the term “sodium magnesium silicate” refers to asilicate of sodium and magnesium and is a synthetic silicate clay,having magnesium and sodium silicate. It is used as a binder and bulkingagent in cosmetics and personal care products, in part because of itsability to absorb water. Sodium magnesium silicate is effective inslowing the decomposition of formulas, and can prevent prematuredarkening of compositions and prevent premature development of a foulodor, thereby improving the shelf life of cosmetic compositions. In someembodiments, the sodium magnesium silicate is Laponite. As used herein,sodium magnesium silicate is useful as a gelling agent or rheologymodifier. Thus, sodium magnesium silicate as used herein may haveproperties similar to an emulsifier. In some embodiments, the sodiummagnesium silicate used herein may be considered an emulsifier. Sodiummagnesium silicate may be used in the sanitizing composition in anamount of about 0.1%, 0.25%, 0.5%, 0.75%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%,4%, 4.5%, 5%, 6%, 7%, 10%, 15%, or greater w/v%, or in an amount withinany two of the aforementioned values or between a range defined by thesevalues. In some embodiments, the amount of sodium magnesium silicate isabout 3% w/v.

As used herein, the term “sodium phosphate monobasic” refers to thechemical formula of NaH₂PO₄, an inorganic compound of sodium withdihydrogen phosphate. Sodium phosphate monobasic may be referred toherein as sodium dihydrogen phosphate, sodium phosphate, monosodiumphosphate, sodium biphosphate, acid sodium phosphate, monosodiumorthophosphate, or primary sodium phosphate. As described herein, sodiumphosphate monobasic may be used for adjustment of pH, as a thickeningagent, or as a buffer. Sodium phosphate monobasic may be used in thesanitizing composition in an amount of about 0.05%, 0.1%, 0.2%, 0.3%,0.4%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 6%, 7%, 10%,15%, or greater w/v%, or in an amount within any two of theaforementioned values. In some embodiments, the amount of sodiumphosphate is about 0.2% w/v.

As used herein, the term “hydrochloric acid” refers to a chloric acidHCl. Hydrochloric acid may be added to the sanitizing composition tolower the pH. In some embodiments, HCl is added as a final step todecrease the pH. In some embodiments, HCl is used as a buffer. In someembodiments, HCl introduces ions, which causes the sanitizingcomposition to thicken as a result of excess ions. Thus, HCl is used insome embodiments as a thickener. Accordingly, in some embodiments isprovided a sanitizing composition including hypochlorous acid, sodiumphosphate, sodium magnesium silicate, dimethicone, and hydrochloricacid. Hydrochloric acid may be used in the sanitizing composition in anamount of about 0.01%, 0.02%, 0.03%, 0.04%, 0.05%, 0.06%, 0.07%, 0.08%,0.09%, 0.1%, 0.2%, 0.3%, 0.4%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%,4.5%, 5%, 6%, 7%, 10%, 15%, or greater w/v%, or in an amount within anytwo of the aforementioned values. In some embodiments, the amount of HClis about 0.08%.

As used herein, the pH of the formulation is the numerical scale tospecify the acidity or basicity of the formulation. In some embodiments,the pH of the formulation is about 5.0, 5.5, 6.0, 6.5, 6.6, 6.7, 6.8,6.9, 7.0, 7.1, 7.2, 7.3, 7.4, 7.5, 7.6, 7.7, 7.8, 7.9, 8.0, or 8.5, orwithin a ranged defined by any two of the aforementioned values. In someembodiments, the pH of the formulation is in a range from about 6.5 toabout 7.8.

The sanitizing composition described herein may further include anadditive known in the art can be included. Exemplary additives includeemulsifiers, detergents, emollients, moisturizers, humectants, pigments,dyes, pearlescent compounds, nacreous pigments, bismuth oxychloridecoated mica, titanium dioxide coated mica, colorants, fragrances,biocides, preservatives, alpha hydroxy acids, antioxidants,anti-microbial agents, anti-fungal agents, antiperspirant agents,exfoliants, hormones, enzymes, medicinal compounds, vitamins, salts,electrolytes, alcohols, polyols, polypropylene glycol, polyisobutene,polyoxyethylene, behenic acid, behenyl, sugar-alcohols, absorbing agentsfor ultraviolet radiation, botanical extracts, surfactants, siliconeoils, organic oils, waxes, alkaline or acidic or buffering agents, filmformers, thickening agents, hyaluronic acid, fumed silica, hydratedsilica, talc, kaolin, starch, modified starch, mica, nylon, clay,bentonite, organo-modified clays and combinations thereof.

In some embodiments, the sanitizing composition described herein ischaracterized in having an osmolality by vapor pressure of about 10, 20,30, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46 ,47, 48, 49, 50, 55,60, 70, 80, 90, or 100 mmol/kg, or within a range defined by any two ofthe aforementioned amounts. In some embodiments, the osmolality by vaporpressure is about 38 mmol/kg. In some embodiments, the osmolality byvapor pressure is about 49 mmol/kg. In some embodiments, the sanitizingcomposition is characterized in having an osmolality by freezing pointdepression of about 10, 15, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30,35, 40, 45, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 65, 70, 80, 90,or 100 mOsm/kg, or within a range defined by any two of theaforementioned amounts. In some embodiments, the osmolality by freezingpoint depression is about 22 mOsm/kg. In some embodiments, theosmolality by freezing point depression is about 54 mOsm/kg.

In some embodiments is provided a method of making the sanitizingcomposition formulation. In some embodiments, the method includesproviding hypochlorite. In some embodiments, the hypochlorite isprovided as a hypochlorite acid or salt. In some embodiments, thehypochlorite is provided as a hypochlorite solution. In someembodiments, the method of making the sanitizing composition includesproviding hypochlorite in an amount of about 10, 15, 20, 25, 30, 35, 40,45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100, 120, 150, 175, 200,250, or 300 ppm or within a range defined by any two of theaforementioned amounts. In some embodiments, hypochlorite is provided inan amount of about 50 to 100 ppm. In some embodiments, the hypochloriteis provided in an amount of about 75 ppm.

In some embodiments, the method of making the sanitizing compositionincludes providing a hypochlorite solution. In some embodiments, thehypochlorite solution is prepared from hypochlorite acids or salts. Insome embodiments, the hypochlorite salt is sodium hypochlorite. In someembodiments, the hypochlorite solution is prepared from sodium chloride.In some embodiments, the method includes running sodium chloridesolution through electrolysis. In some embodiments, the sodium chloridesolution is provided in an amount of about 0.1%, 0.15%, 0.2%, 0.25%,0.3%, 0.35%, or 0.4% w/v. In some embodiments, the sodium chloride is0.28%, and the resulting hypochlorite solution is about 300 ppm. In someembodiments, the method of making the sanitizing composition includesdiluting the hypochlorite solution to provide hypochlorite in an amountof about 10, 15, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85,90, 95, 100, 120, 150, 175, 200, 250, or 300 ppm or within a rangedefined by any two of the aforementioned amounts. In some embodiments,hypochlorite is provided in an amount of about 50 to 100 ppm. In someembodiments, the hypochlorite is provided in an amount of about 75 ppm.

In some embodiments, the method of making the sanitizing compositionfurther includes providing a silicone polymer or a blend of siliconepolymers. In some embodiments, the silicone polymer is a siliconepolymer blend of dimethicone and cyclomethicone in a ratio of about 1:1.In some embodiments, the silicone polymer or blend thereof is providedin an amount of about 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%,10%, or 15%, w/v, or within a range defined by any two of theaforementioned amounts. In some embodiments, the silicone polymer orblend thereof is provided in an amount of about 3% w/v.

In some embodiments, the method further includes providing sodiummagnesium silicate. In some embodiments, the sodium magnesium silicateis provided in an amount of about 0.1%, 0.25%, 0.5%, 0.75%, 1%, 1.5%,2%, 2.5%, 3%, 3.5%, 4%, 4.5%, 5%, 6%, 7%, 10%, or 15% w/v or within arange defined by any two of the aforementioned amounts. In someembodiments, the sodium magnesium silicate is provided in an amount ofabout 3% w/v.

In some embodiments, the method of making the sanitizing compositionfurther includes providing sodium phosphate, HCl, water, or buffer orcombinations thereof. In some embodiments, the sodium phosphate isprovided in an amount of about 0.05%, 0.1%, 0.2%, 0.3%, 0.4%, 0.5%, 1%,1.5%, 2%, or 2.5% w/v or within a range defined by any two of theaforementioned amounts. In some embodiments, sodium phosphate isprovided in an amount of about 0.2% w/v.

In some embodiments, HCl may be used in the sanitizing composition in anamount of about 0.01%, 0.02%, 0.03%, 0.04%, 0.05%, 0.06%, 0.07%, 0.08%,0.09%, 0.1%, 0.2%, 0.3%, 0.4%, 0.5%, 1%, 1.5%, 2%, 2.5%, 3%, 3.5%, 4%,4.5%, 5%, 6%, 7%, 10%, 15%, or greater w/v%, or in an amount within anytwo of the aforementioned values. In some embodiments, the amount of HClis about 0.08%.

In some embodiments, the water and/or buffer is provided in an amount tomake up the balance of the sanitizing composition, and is provided in anamount of about 20%, 30%, 40%, 45%, 50%, 55%, 56%, 57%, 58%, 59%, 60%,61%, 61.55%, 62%, 62.5%, 63%, 65%, 70%, 75%, 80%, or 90% w/v or within arange defined by any two of the aforementioned amounts.

As used herein, the term “buffer” refers to a buffering agent and isused for balancing the pH and/or osmolality of the sanitizingcomposition. Examples of a buffer for use herein include, for example,salts of phosphates (such as sodium phosphate), borates, citrates,malates, formates, lactates, succinates, acetates, ascorbates,carbonates, bicarbonates, organic compound based buffers (including, forexample, TRIS, HEPES, MOPS, MES, PIPES, TES, bicine, tricine, TAPSO),sodium ions, potassium ions, chloride ions (such as from HCl),bicarbonate ions, glucose, sucrose, peptides, proteins, a combination ormixture thereof or other agents that are chemically, functionally, orphysiologically equivalent or similar. The sanitizing compositioncompositions provided herein have an optimum pH and viscosity, with anosmolality that is hypo-osmotic, having an osmolality by vapor pressureof about 10, 20, 30, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47,48, 49, 50, 55, 60, 70, 80, 90, or 100 mmol/kg, or within a rangedefined by any two of the aforementioned amounts. In some embodiments,the osmolality by vapor pressure is about 38 mmol/kg. In someembodiments, the osmolality by vapor pressure is about 49 mmol/kg. Insome embodiments, the sanitizing composition is characterized in havingan osmolality by freezing point depression of about 10, 15, 20, 21, 22,23, 24, 25, 26, 27, 28, 29, 30, 35, 40, 45, 50, 51, 52, 53, 54, 55, 56,57, 58, 59, 60, 65, 70, 80, 90, or 100 mOsm/kg, or within a rangedefined by any two of the aforementioned amounts. In some embodiments,the osmolality by freezing point depression is about 22 mOsm/kg. In someembodiments, the osmolality by freezing point depression is about 54mOsm/kg. The osmolality of the sanitizing composition can be determinedby vapor pressure osmometry or freezing point osmometry.

In some embodiments is provided a method of using a sanitizingcomposition. In some embodiments, the method includes providing thesanitizing composition and applying the sanitizing composition. In someembodiments, the sanitizing composition is provided as a ready-to-useformulation that includes hypochlorite or acids or salts thereof,silicone polymer or a blend of silicone polymers, and sodium magnesiumsilicate, and further may include sodium phosphate, HCl, water, orbuffer. In some embodiments, the sanitizing composition is provided inportions, and further additions and/or mixing is required prior to use.In some embodiments, the sanitizing composition is applied to the handsof a user. In some embodiments, the sanitizing composition is appliedmultiple times daily, once daily, multiple times weekly, once weekly,multiple times monthly, or once monthly, or within a time frame definedby any two of the aforementioned time frames. In some embodiments, thesanitizing composition is applied liberally. In some embodiments, thesanitizing composition is applied meagerly.

In some embodiments, the sanitizing composition as disclosed herein isuseful for disinfecting a surface, including hands. In some embodiments,the sanitizing composition described herein is used in a healthcarefacility setting. In some embodiments, the sanitizing compositionincludes hypochlorite, or a salt or acid thereof, a blend of dimethiconeand cyclomethicone, and sodium magnesium silicate. In some embodiments,the sanitizing composition includes water and/or buffer, hypochlorousacid solution, a blend of dimethicone and cyclomethicone, sodiummagnesium silicate, sodium phosphate, and HCl.

In some embodiments is provided a method of using a sanitizingcomposition for eliminating microbial causing infections. In someembodiments, the sanitizing composition provided herein is capable ofdestroying or preventing superbug infections. In some embodiments, thesanitizing compositions destroy or prevent infections of Staphylococcusaureus (including methicillin-resistant S. aureus (MRSA) andvancomycin-resistant S. aureus (VRSA)), extended spectrum beta-lactamase(ESBL), Pseudomonas aeruginosa, Clostridium difficile, Salmonella,Mycobacterium tuberculosis, Escherichia coli (including Carbapenemresistant E. coli), multidrug-resistant Acinetobacter baumannii (MRAB),vancomycin-resistant Enterococcus (VRE), Carbapenem resistant Klebsiellapneumoniae, HIV, hepatitis, and influenza. In embodiments,administration of a sanitizing composition will kill one or moresuperbugs.

In some embodiments is provided a method of using the sanitizingcomposition to stop a fungal infection. In some embodiments, the fungalinfection is caused by a yeast of the Candida genus. In one embodiment,the yeast is of the Candida albicans species. In other embodiments, theCandida yeast may be of the Candida dubliniensis, Candida parapsilosis,Candida tropicalis, Candida kerfyr, Candida guilliermondii, Candidainconspicua, Candida famata, Candida glabrata, Candida krusei, Candidalusitaniae, or other Candida species, or combinations thereof. In someembodiments, the sanitizing composition is used to stop a viralinfection.

In some embodiments, the sanitizing composition as disclosed herein isuseful as a hand sanitizer or as a medical or surgical disinfectant foruse with medical instruments for disinfecting a medical device orinstrument prior to, during, or after use. In some embodiments, thesanitizing composition is useful for disinfecting counter tops and tabletops. In some embodiments, the sanitizing compositions are useful fordisinfecting items found in areas of public use, such as hand rails,benches, or other items that may be prone to frequent public use, andwhich may harbor microbial colonies.

In some embodiments, the sanitizing composition as disclosed herein isuseful for sanitizing a surface without causing damage or harm to thesurface. Some commonly used sanitizing compositions, includingalcohol-based compositions, are known to adversely break down the finishof a surface, such as a wax or shine of a floor. However, thecompositions described herein advantageously do not degrade the finishof a surface, including the wax or shine of a floor.

The invention is generally disclosed herein using affirmative languageto describe the numerous embodiments. The invention also includesembodiments in which subject matter is excluded, in full or in part,such as substances or materials, method steps and conditions, protocols,or procedures.

EXAMPLES

Some aspects of the embodiments discussed above are disclosed in furtherdetail in the following examples, which are not in any way intended tolimit the scope of the present disclosure. Those in the art willappreciate that many other embodiments also fall within the scope of theinvention as it is described herein above and/or in the claims.

Example 1 Preparation of Sanitizing Compositions

The following example demonstrates the method of preparing thesanitizing composition and various compositions or formulations thereof.

A sanitizing composition was prepared with the ingredients as providedin Table 1. Hypochlorite or a salt or acid thereof was added to water, ablend of dimethicone and cyclomethicone, sodium magnesium silicate, andsodium phosphate in the preparation of a sanitizing composition.

TABLE 1 Sanitizing Composition Ingredient Quantity Water and/or bufferbalance Hypochlorite 75 ppm Dimethicone and Cyclomethicone Blend 3% w/vSodium Magnesium Silicate 3% w/v Sodium Phosphate 0.2% w/v

The sanitizing composition formulation described in Table 1 is usefulinhibiting, eradicating, or reducing an organismal population. Variousmicrobial pathogens may be inhibited or reduced, includingStaphylococcus aureus (including methicillin-resistant S. aureus (MRSA)and vancomycin-resistant S. aureus (VRSA)), extended spectrumbeta-lactamase (ESBL), Pseudomonas aeruginosa, Clostridium difficile,Salmonella, Mycobacterium tuberculosis, Escherichia coli (includingCarbapenem resistant E. coli), multidrug-resistant Acinetobacterbaumannii (MRAB), vancomycin-resistant Enterococcus (VRE), Carbapenemresistant Klebsiella pneumoniae, HIV, hepatitis, and influenza.

Alternative Preparation Example 1

A sanitizing composition having 25% of a 220 ppm hypochlorite solutionwas added to 3% w/v of a blend of dimethicone and cyclomethicone, with3% w/v sodium magnesium silicate and 0.2% sodium phosphate, with thebalance water. The hypochlorite solution was prepared by passing 0.28%sodium chloride through electrolysis to provide a 220 ppm hypochloritesolution. The composition was thickened by adding hydrochloric acid inan amount of 0.05% w/v.

In another alternative composition, the ingredients are identical tothose shown in Table 1, but sodium phosphate is replaced with 0.08% w/vhydrochloric acid, as shown in Table 2.

TABLE 2 Alternative Composition Ingredient Quantity Water and/or bufferbalance Hypochlorite 75 ppm Dimethicone and Cyclomethicone Blend 3% w/vSodium Magnesium Silicate 3% w/v Hydrochloric Acid 0.08% w/v

Example 2 Time Kill Assay for Antimicrobial Agents

The following example demonstrates the efficacy of some embodiments ofthe sanitizer as described herein.

A sanitizing composition was used to determine the efficacy as anantimicrobial agent against a variety of microbes. The composition wasprepared as described in Example 1, and was exposed to the microbes forvarious lengths of time. Test microbes were obtained from the AmericanType Culture Collection (ATCC; Manassas, Va.), Centers for DiseaseControl and Prevention (CDC; Atlanta, Ga.), and the NARSA ContractsAdministrator at Focus Technologies, Inc. (Herndon, Va.). Bacteria weregrown in tryptic soy agar+5% sheep's blood at 35-37° C. in aerobicconditions. The neutralizer for the bacteria was Letheen broth+0.1%sodium thiosulfate. Candida albicans was grown in Sabouraud dextroseagar at 25-30° C. in aerobic conditions. The neutralizer for C. albicanswas Sabouraud dextrose broth+0.1% sodium thiosulfate. A suspension ofthe test organism was exposed to the sanitizing composition for thespecified exposure time (15, 30, 60, or 120 seconds) at ambienttemperature (20° C.). Each test was performed in replicate. Afterexposure, an aliquot of the suspension was transferred to a neutralizerand was assayed for survivors. Appropriate culture purity, neutralizersterility, test population, and neutralization confirmation controlswere performed. Table 3 provides the raw data for the number ofsurvivors (in colony forming units, CFU) at each exposure time and atdilutions of 10° (1.00 mL), 10° (0.100 mL), 10⁻¹ (0.100 mL), 10⁻² (0.100mL), and 10⁻³ (0.100 mL).

TABLE 3 Time Kill Test Results Dilution Exposure Time (seconds) (Volume15 30 60 120 Test Organism Plated) Number of Survivors (CFU) Multi-drugResistant 10⁰ (1.00 mL) T, T 0, 0 0, 0 0, 0 Acinetobacter baumannii 10⁰(0.100 mL) 63, 52 0, 0 0, 0 0, 0 (MRAB; ATCC 19606) 10⁻¹ (0.100 mL) 7, 50, 0 0, 0 0, 0 10⁻² (0.100 mL) 3, 2 0, 0 0, 0 0, 0 10⁻³ (0.100 mL) 0, 00, 0 0, 0 0, 0 Candida albicans (ATCC 10⁰ (1.00 mL) T, T T, T T, T T, T10231) 10⁰ (0.100 mL) T, T T, T T, T T, T 10⁻¹ (0.100 mL) 179, 120 120,134 T, T T, T 10⁻² (0.100 mL) 23, 18 24, 30 33, 35 38, 33 10⁻³ (0.100mL) 5, 6 1, 5 2, 5 11, 4  Vancomycin Resistant 10⁰ (1.00 mL) T, T 216,250 0, 0 0, 0 Enterococcus faecalis 10⁰ (0.100 mL) T, T 21, 20 0, 0 0, 0(VRE; ATCC 51299) 10⁻¹ (0.100 mL) 52, 61 6, 1 0, 0 0, 0 10⁻² (0.100 mL)12, 13 0, 0 0, 0 0, 0 10⁻³ (0.100 mL) 1, 0 0, 0 0, 0 0, 0 Escherichiacoli (ATCC 10⁰ (1.00 mL) 0, 0 0, 0 0, 0 0, 0 11229) 10⁰ (0.100 mL) 0, 00, 0 0, 0 0, 0 10⁻¹ (0.100 mL) 0, 0 1, 2 0, 0 0, 0 10⁻² (0.100 mL) 3, 10, 0 0, 0 0, 0 10⁻³ (0.100 mL) 0, 0 0, 0 0, 0 0, 0 Carbapenem Resistant10⁰ (1.00 mL) T, T 83, 61 0, 0 0, 0 Escherichia coli (CDC 10⁰ (0.100 mL)T, T 7, 7 0, 0 0, 0 81371) 10⁻¹ (0.100 mL) 40, 39 0, 3 0, 0 0, 0 10⁻²(0.100 mL) 6, 2 0, 0 0, 0 0, 0 10⁻³ (0.100 mL) 0, 0 0, 0 0, 0 0, 0Extended-Spectrum beta- 10⁰ (1.00 mL) T, T 0, 0 0, 0 0, 0 lactamase(ESBL) 10⁰ (0.100 mL) 43, 46 0, 0 0, 0 0, 0 producing Escherichia 10⁻¹(0.100 mL) 5, 6 0, 0 0, 0 0, 0 coli (ATCC BAA-196) 10⁻² (0.100 mL) 0, 00, 0 0, 0 0, 0 10⁻³ (0.100 mL) 0, 0 0, 0 0, 0 0, 0 Carbapenem Resistant10⁰ (1.00 mL) 164, 112 0, 0 T, T 0, 0 Klebsiella pneumoniae 10⁰ (0.100mL) 15, 12 0, 0 82, 54 0, 0 (ATCC BAA-1705) 10⁻¹ (0.100 mL) 0, 1 0, 010, 18 0, 0 10⁻² (0.100 mL) 0, 0 0, 0 0, 1 0, 0 10⁻³ (0.100 mL) 0, 0 0,0 0, 2 0, 0 Pseudomonas aeruginosa 10⁰ (1.00 mL)  92, 152 0, 0 0, 0 0, 0(ATCC 15442) 10⁰ (0.100 mL) 11, 6  0, 0 0, 0 0, 0 10⁻¹ (0.100 mL) 2, 10, 0 0, 0 0, 0 10⁻² (0.100 mL) 0, 0 0, 0 0, 0 0, 0 10⁻³ (0.100 mL) 0, 00, 0 0, 0 0, 0 Salmonella enterica 10⁰ (1.00 mL) 142, 122 0, 0 0, 0 0, 0(ATCC 10708) 10⁰ (0.100 mL) 12, 14 0, 0 0, 0 0, 0 10⁻¹ (0.100 mL) 0, 10, 0 0, 0 0, 0 10⁻² (0.100 mL) 0, 1 0, 0 0, 0 0, 0 10⁻³ (0.100 mL) 0, 00, 0 0, 0 0, 0 Staphylococcus aureus 10⁰ (1.00 mL) 18, 17 0, 0 0, 0 0, 0(ATCC 6538) 10⁰ (0.100 mL) 3, 5 0, 0 0, 0 0, 0 10⁻¹ (0.100 mL) 0, 0 0, 00, 0 0, 0 10⁻² (0.100 mL) 0, 0 0, 0 0, 0 0, 0 10⁻³ (0.100 mL) 0, 0 0, 00, 0 0, 0 Methicillin Resistant 10⁰ (1.00 mL) T, T 0, 0 0, 0 0, 0Staphylococcus aureus 10⁰ (0.100 mL) T, T 0, 0 0, 0 0, 0 (MRSA; ATCC33592) 10⁻¹ (0.100 mL) 96, 78 0, 0 0, 0 0, 0 10⁻² (0.100 mL) 13, 13 0, 00, 0 0, 0 10⁻³ (0.100 mL) 2, 0 0, 0 0, 0 0, 0 Vancomycin Resistant 10⁰(1.00 mL) T, T 4, 1 0, 0 0, 0 Staphylococcus aureus 10⁰ (0.100 mL) T, T0, 0 0, 0 0, 0 (VRSA; NARSA VRS1) 10⁻¹ (0.100 mL) 93, 68 0, 0 0, 0 0, 010⁻² (0.100 mL) 15, 14 0, 0 0, 0 0, 0 10⁻³ (0.100 mL) 1, 1 0, 0 0, 0 0,0 T = Too numerous to count (>300 colonies) CFU = Colony Forming Units

The raw data presented in Table 3 was used to calculate the percentreduction and Log₁₀ survivors, and is presented in Table 4. A value of<1 was used in place of zero for calculation purposes. The datapresented below shows a percent reduction of bacterial populations inthe tested bacteria ranging from about 95.4% to greater than about 99.9%at 15 seconds, from about 99.8% to greater than about 99.999% at 30seconds, from about 99.8% to greater than about 99.999% at 60 seconds,and greater than about 99.999% at 120 seconds.

TABLE 4 Calculated Survival of Time Kill Assay CFU/mL in Test ExposurePopulation CFU/mL Time Control of Log₁₀ Percent Log₁₀ Test Organism(seconds) (Log₁₀) Survivors Survivors Reduction Reduction Multi-drugResistant 15  3.2 × 10⁶  5.8 × 10³ 3.76 99.8% 2.75 Acinetobacter 30(6.51) <5 <0.70 >99.999% >5.81 baumannii (MRAB; 60 <5<0.70 >99.999% >5.81 ATCC 19606) 120 <5 <0.70 >99.999% >5.81 Candidaalbicans 15 1.57 × 10⁵ 1.50 × 10⁵ 5.18 4.46% 0.02 (ATCC 10231) 30 (5.20)1.27 × 10⁵ 5.10 19.1% 0.10 60  3.4 × 10⁵ 5.53 No No reduction reduction120  3.6 × 10⁵ 5.56 No No reduction reduction Vancomycin Resistant 152.02 × 10⁶  5.7 × 10⁴ 4.76 97.2% 1.55 Enterococcus faecalis 30 (6.31)2.33 × 10³ 3.37 >99.8% 2.94 (VRE; ATCC 51299) 60 <5 <0.70 >99.999% >5.61120 <5 <0.70 >99.999% >5.61 Escherichia coli 15  3.2 × 10⁶   2 × 10⁴4.30 99.4% 2.21 (ATCC 11229) 30 (6.51)   2 × 10³ 3.30 99.9% 3.21 60 <5<0.70 >99.999% >5.81 120 <5 <0.70 >99.999% >5.81 Carbapenem Resistant 151.99 × 10⁶  4.0 × 10⁴ 4.60 98.0% 1.70 Escherichia coli (CDC 30 (6.30) 7.2 × 10² 2.86 >99.9% 3.44 81371) 60 <5 <0.70 >99.999% >5.60 120 <5<0.70 >99.999% >5.60 Extended-Spectrum 15 1.09 × 10⁶  4.5 × 10³ 3.6599.6% 2.39 beta-lactamase (ESBL) 30 (6.04) <5 <0.70 >99.999% >5.34producing Escherichia 60 <5 <0.70 >99.999% >5.34 coli (ATCC BAA-196) 120<5 <0.70 >99.999% >5.34 Carbapenem Resistant 15  3.3 × 10⁶ 1.38 × 10³3.14 >99.9% 3.38 Klebsiella pneumoniae 30 (6.52) <5 <0.70 >99.999% >5.82(ATCC BAA-1705) 60  6.8 × 10³ 3.83 99.8% 2.69 120 <5<0.70 >99.999% >5.82 Pseudomonas 15 1.27 × 10⁶ 1.22 × 10³ 3.09 99.9%3.01 aeruginosa (ATCC 30 (6.10) <5 <0.70 >99.999% >5.40 15442) 60 <5<0.70 >99.999% >5.40 120 <5 <0.70 >99.999% >5.40 Salmonella enterica 151.55 × 10⁶ 1.32 × 10³ 3.12 99.9% 3.07 (ATCC 10708) 30 (6.19) <5<0.70 >99.999% >5.49 60 <5 <0.70 >99.999% >5.49 120 <5<0.70 >99.999% >5.49 Staphylococcus aureus 15 2.81 × 10⁶  1.8 × 10² 2.2699.99% 4.19 (ATCC 6538) 30 (6.45) <5 <0.70 >99.999% >5.75 60 <5<0.70 >99.999% >5.75 120 <5 <0.70 >99.999% >5.75 Methicillin Resistant15  4.8 × 10⁶  8.7 × 10⁴ 4.94 98.2% 1.74 Staphylococcus aureus 30 (6.68)<5 <0.70 >99.999% >5.98 (MRSA; ATCC 33592) 60 <5 <0.70 >99.999% >5.98120 <5 <0.70 >99.999% >5.98 Vancomycin Resistant 15 1.78 × 10⁶  8.1 ×10⁴ 4.91 95.4% 1.34 Staphylococcus aureus 30 (6.25)   3 × 10¹1.48 >99.99% 4.77 (VRSA; NARSA 60 <5 <0.70 >99.999% >5.55 VRS1) 120 <5<0.70 >99.999% >5.55

The data presented in Example 2 indicates the potent antimicrobialproperties of the sanitizing compositions provided in some embodimentsherein, and shows that the composition is useful for the inhibition,eradication, and reduction of microbial populations.

In at least some of the previously described embodiments, one or moreelements used in an embodiment can interchangeably be used in anotherembodiment unless such a replacement is not technically feasible. Itwill be appreciated by those skilled in the art that various otheromissions, additions and modifications may be made to the methods andstructures described above without departing from the scope of theclaimed subject matter. All such modifications and changes are intendedto fall within the scope of the subject matter, as defined by theappended claims.

With respect to the use of substantially any plural and/or singularterms herein, those having skill in the art can translate from theplural to the singular and/or from the singular to the plural as isappropriate to the context and/or application. The varioussingular/plural permutations may be expressly set forth herein for sakeof clarity.

It will be understood by those within the art that, in general, termsused herein, and especially in the appended claims (for example, bodiesof the appended claims) are generally intended as “open” terms (forexample, the term “including” should be interpreted as “including butnot limited to,” the term “having” should be interpreted as “having atleast,” the term “includes” should be interpreted as “includes but isnot limited to,” etc.). It will be further understood by those withinthe art that if a specific number of an introduced claim recitation isintended, such an intent will be explicitly recited in the claim, and inthe absence of such recitation no such intent is present. For example,as an aid to understanding, the following appended claims may containusage of the introductory phrases “at least one” and “one or more” tointroduce claim recitations. However, the use of such phrases should notbe construed to imply that the introduction of a claim recitation by theindefinite articles “a” or “an” limits any particular claim containingsuch introduced claim recitation to embodiments containing only one suchrecitation, even when the same claim includes the introductory phrases“one or more” or “at least one” and indefinite articles such as “a” or“an” (for example, “a” and/or “an” should be interpreted to mean “atleast one” or “one or more”); the same holds true for the use ofdefinite articles used to introduce claim recitations. In addition, evenif a specific number of an introduced claim recitation is explicitlyrecited, those skilled in the art will recognize that such recitationshould be interpreted to mean at least the recited number (for example,the bare recitation of “two recitations,” without other modifiers, meansat least two recitations, or two or more recitations). Furthermore, inthose instances where a convention analogous to “at least one of A, B,and C, etc.” is used, in general such a construction is intended in thesense one having skill in the art would understand the convention (forexample, “a system having at least one of A, B, and C” would include butnot be limited to systems that have A alone, B alone, C alone, A and Btogether, A and C together, B and C together, and/or A, B, and Ctogether, etc.). In those instances where a convention analogous to “atleast one of A, B, or C, etc.” is used, in general such a constructionis intended in the sense one having skill in the art would understandthe convention (for example, “a system having at least one of A, B, orC” would include but not be limited to systems that have A alone, Balone, C alone, A and B together, A and C together, B and C together,and/or A, B, and C together, etc.). It will be further understood bythose within the art that virtually any disjunctive word and/or phrasepresenting two or more alternative terms, whether in the description,claims, or drawings, should be understood to contemplate thepossibilities of including one of the terms, either of the terms, orboth terms. For example, the phrase “A or B” will be understood toinclude the possibilities of “A” or “B” or “A and B.”

In addition, where features or aspects of the disclosure are describedin terms of Markush groups, those skilled in the art will recognize thatthe disclosure is also thereby described in terms of any individualmember or subgroup of members of the Markush group.

As will be understood by one skilled in the art, for any and allpurposes, such as in terms of providing a written description, allranges disclosed herein also encompass any and all possible sub-rangesand combinations of sub-ranges thereof. Any listed range can be easilyrecognized as sufficiently describing and enabling the same range beingbroken down into at least equal halves, thirds, quarters, fifths,tenths, etc. As a non-limiting example, each range discussed herein canbe readily broken down into a lower third, middle third and upper third,etc. As will also be understood by one skilled in the art all languagesuch as “up to,” “at least,” “greater than,” “less than,” and the likeinclude the number recited and refer to ranges which can be subsequentlybroken down into sub-ranges as discussed above. Finally, as will beunderstood by one skilled in the art, a range includes each individualmember. Thus, for example, a group having 1-3 articles refers to groupshaving 1, 2, or 3 articles. Similarly, a group having 1-5 articlesrefers to groups having 1, 2, 3, 4, or 5 articles, and so forth.

While various aspects and embodiments have been disclosed herein, otheraspects and embodiments will be apparent to those skilled in the art.The various aspects and embodiments disclosed herein are for purposes ofillustration and are not intended to be limiting, with the true scopeand spirit being indicated by the following claims.

What is claimed is:
 1. A method of disinfecting a surface, comprising:applying to the surface a sanitizing formulation comprisinghypochlorite.
 2. The method of claim 1, wherein the surface is skin. 3.The method of claim 1, wherein the sanitizing formulation furthercomprises at least one of sodium phosphate or hydrochloric acid, sodiummagnesium silicate, and a silicone polymer or blend thereof.
 4. Themethod of claim 3, wherein hypochlorite is in an amount of about 75 ppm,wherein the sodium phosphate is in an amount of about 0.2% w/v, whereinthe hydrochloric acid is in an amount of about 0.08% w/v, wherein thesodium magnesium silicate is in an amount of about 3% w/v, and whereinthe silicone polymer or blend thereof is in an amount of about 3% w/v.5. The method of claim 1, wherein the sanitizing formulation furthercomprises water, buffer, or combinations thereof.
 6. The method of claim1, wherein the applying comprises killing at least one superbug.
 7. Themethod of claim 6, wherein the at least one superbug is selected fromthe group consisting of Staphylococcus aureus (includingmethicillin-resistant S. aureus (MRSA) and vancomycin-resistant S.aureus (VRSA)), extended spectrum beta-lactamase (ESBL), Pseudomonasaeruginosa, Clostridium difficile, Salmonella, Mycobacteriumtuberculosis, Escherichia coli (including Carbapenem resistant E. coli),multidrug-resistant Acinetobacter baumannii (MRAB), vancomycin-resistantEnterococcus (VRE), Carbapenem resistant Klebsiella pneumoniae, HIV,hepatitis, and influenza.
 8. A sanitizing formulation, comprising:hypochlorous acid; sodium phosphate or hydrochloric acid; sodiummagnesium silicate; and a silicone polymer or blend thereof.
 9. Theformulation of claim 8, wherein the hypochlorous acid is present in anamount of about 50 to about 200 ppm.
 10. The formulation of claim 8,wherein the sodium phosphate is present in an amount of about 0.1 toabout 0.5% w/v.
 11. The formulation of claim 8, wherein the hydrochloricacid is present in an amount of about 0.01% to about 15% w/v.
 12. Theformulation of claim 8, wherein the sodium magnesium silicate is presentin an amount of 0 to about 5% w/v.
 13. The formulation of claim 8,wherein the silicone polymer or blend thereof comprises a blend ofdimethicone and cyclomethicone.
 14. The formulation of claim 8, whereinthe silicone polymer or blend thereof is present in an amount of about 1to about 20% w/v.
 15. The formulation of claim 8, wherein thehypochlorous acid is in an amount of about 75 ppm, wherein the sodiumphosphate is in an amount of about 0.2% w/v, wherein the sodiummagnesium silicate is in an amount of about 3% w/v, and wherein thesilicone polymer or blend thereof is in an amount of about 3% w/v. 16.The formulation of claim 8, wherein the hypochlorous acid is in anamount of about 75 ppm, wherein the hydrochloric acid is in an amount ofabout 0.08% w/v, wherein the sodium magnesium silicate is in an amountof about 3% w/v, and wherein the silicone polymer or blend thereof is inan amount of about 3% w/v.
 17. The formulation of claim 8, wherein thepH is in the range from 6.5-7.8.
 18. The formulation of claim 8, furthercomprising water, buffer, or combinations thereof.